Intel is using ASML’s High-NA EUV tools to pattern select Panther Lake layers, marking the technology’s first use in ...

Gigaphoton (Japan) announced a 104 watt Extreme Ultraviolet (EUV) light source which is a critical part for the realization of the first volume-production-worthy EUV light source target for 2011. It ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has successfully achieved continuous operation of 140W EUV light source at 50 ...

High NA EUV reaches new readiness milestone with first high-volume Logic product Intel Foundry has entered high-volume manufacturing for a subset ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced success in achieving a world record 5% conversion efficiency with 100W of ...

A University of Central Florida research team has made a substantial inroad toward establishing extreme ultraviolet light (EUV) as a primary power source for manufacturing the next generation of ...

U.S. Commerce Secretary Lutnick expresses concerns in a conversation with ASML executives that China has an EUV lithography system as ASML denies shipping such scanners to the PRC.

One of three laser produced plasma (LPP) EUV light-source suppliers in the world, Adlyte is the only one focused on developing light sources for photomask and wafer inspection applications, which are ...

The technology competition to supply the source of EUV radiation for the next-generation lithography tools has long been divided between the laser-produced plasma (LPP) approach, favored by Cymer (San ...

EUV Lithography light source maker, Gigaphoton has developed a laser-produced plasma (LPP) light source prototype model that can produce a maximum of 92 watts. This is more than double the 43 watts ...